Method and system for cleaning a chemical mechanical polishing pad
A Standard patent application filed on 02 May 2000 credited to Mikhaylich, Katrina A.
;
Svirchevski, Julia S.
Details
Application number :
46918
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method and system for cleaning a chemical mechanical polishing pad