Gate material for semiconductor device fabrication
A Standard patent application filed on 22 October 2003 credited to Lochtefeld, Anthony J.
;
Currie, Matthew T.
;
Antoniadis, Dimitri
Details
Application number :
2003301603
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Gate material for semiconductor device fabrication
Inventor :
Lochtefeld, Anthony J.
;
Currie, Matthew T.
;
Antoniadis, Dimitri