Aligner, microdevice, photomask, exposure method, and method of manufacturing device
A Standard patent application filed on 11 April 2000 credited to Irie, Nobuyuki

Details

Application number :
36765  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Aligner, microdevice, photomask, exposure method, and method of manufacturing device  
Inventor :
Irie, Nobuyuki  
Agent name :
 
Address for service :
 
Filing date :
11 April 2000  
Associated companies :
 
Applicant name :
Nikon Corporation  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor