Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream
A Standard patent application filed on 01 December 2003 credited to Sweeney, Joseph D. ; Olander, W. Karl ; Marganski, Paul J. ; Wang, Luping

Details

Application number :

2003293168  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream  

Inventor :

Sweeney, Joseph D. ; Olander, W. Karl ; Marganski, Paul J. ; Wang, Luping  

Agent name :

 

Address for service :

 

Filing date :

01 December 2003  

Associated companies :

 

Applicant name :

ADVANCED TECHNOLOGY MATERIALS, INC.  

Applicant address :

Margaret Chappuis, 7 Commerce Drive, Danbury, CT 06810  

Old name :

 

Original Source :

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