Process for producing photoresist composition, filter, coater and photoresist composition
A Standard patent application filed on 18 December 2003 credited to Hada, Hideo ; Tomida, Hiroaki ; Ozaki, Hirokazu ; Iwai, Takeshi ; Muroi, Masaaki ; Shimazaki, Masaaki ; Atsuchi, Kota

Details

Application number :

2003289431  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Process for producing photoresist composition, filter, coater and photoresist composition  

Inventor :

Hada, Hideo ; Tomida, Hiroaki ; Ozaki, Hirokazu ; Iwai, Takeshi ; Muroi, Masaaki ; Shimazaki, Masaaki ; Atsuchi, Kota  

Agent name :

 

Address for service :

 

Filing date :

18 December 2003  

Associated companies :

 

Applicant name :

TOKYO OHKA KOGYO CO., LTD.  

Applicant address :

150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa 211-0012  

Old name :

 

Original Source :

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