Raster frame beam system for electron beam lithography
A Standard patent application filed on 31 October 2003 credited to Litman, Alon ; Meshulach, Doron ; Almogy, Gilad ; Lehman, Yonatan ; Aloni, Meir ; Freidman, Mula ; Vishnipolsky, Jimmy

Details

Application number :

2003286838  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Raster frame beam system for electron beam lithography  

Inventor :

Litman, Alon ; Meshulach, Doron ; Almogy, Gilad ; Lehman, Yonatan ; Aloni, Meir ; Freidman, Mula ; Vishnipolsky, Jimmy  

Agent name :

 

Address for service :

 

Filing date :

31 October 2003  

Associated companies :

 

Applicant name :

APPLIED MATERIALS ISRAEL, LTD.  

Applicant address :

8 Oppenheimer Street, 76236 Rehovot  

Old name :

 

Original Source :

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