Removing silicon oxide from a substrate
A Standard patent application filed on 31 October 2003 credited to Craigo, James B. ; Edwards, John L. Jr. ; Droopad, Ravindranath ; Yu, Zhiyi ; Wei, Yi ; Liang, Yong ; Hu, Xiaoming

Details

Application number :

2003286795  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Removing silicon oxide from a substrate  

Inventor :

Craigo, James B. ; Edwards, John L. Jr. ; Droopad, Ravindranath ; Yu, Zhiyi ; Wei, Yi ; Liang, Yong ; Hu, Xiaoming  

Agent name :

 

Address for service :

 

Filing date :

31 October 2003  

Associated companies :

 

Applicant name :

FREESCALE SEMICONDUCTOR, INC.  

Applicant address :

6501 William Cannon Drive West Austin, TX 78735 United States of America  

Old name :

 

Original Source :

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