Method and apparatus for detecting endpoint during plasma etching of thin films
A Standard patent application filed on 22 October 2003 credited to Mcmillin, Brian K. ; Marks, Jeffrey ; Hudson, Eric

Details

Application number :

2003284890  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for detecting endpoint during plasma etching of thin films  

Inventor :

Mcmillin, Brian K. ; Marks, Jeffrey ; Hudson, Eric  

Agent name :

 

Address for service :

 

Filing date :

22 October 2003  

Associated companies :

 

Applicant name :

LAM RESEARCH CORPORATION  

Applicant address :

P1061PCT, 4650 Cushing Parkway, Fremont, CA 94538  

Old name :

 

Original Source :

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