A reactive ion etching process

Application number :: 35685
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: A reactive ion etching process
Inventor :: Ruano-Lopez, Jesus Miguel ; Bonar, James Ronald ; Mclaughlin, Andrew James ; Aitchison, James Stewart ; Jubber, Michael George ; Wilkinson, Christopher D. W. ; Da Silva Marques, Paulo Vicente
Agent name :
Address for service :
Filing date :: 30 March 2000
Associated companies :
Applicant name :: University Court of The University of Glasgow, The
Applicant address :
Old name :
Original Source :: Go

A reactive ion etching process A Standard patent application filed on 30 March 2000 credited to Ruano-Lopez, Jesus Miguel ; Bonar, James Ronald ; Mclaughlin, Andrew James ; Aitchison, James Stewart ; Jubber, Michael George ; Wilkinson, Christopher D. W. ; Da Silva Marques, Paulo Vicente