Atomic layer deposition of noble metals
A Standard patent application filed on 15 October 2003 credited to Lu, Toh-Ming ; Senkevich, John J.

Details

Application number :

2003282836  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Atomic layer deposition of noble metals  

Inventor :

Lu, Toh-Ming ; Senkevich, John J.  

Agent name :

 

Address for service :

 

Filing date :

15 October 2003  

Associated companies :

 

Applicant name :

RENSSELAER POLYTECHNIC INSTITUTE  

Applicant address :

110 8th Street, Troy, NY 12180  

Old name :

 

Original Source :

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