Post cmp porogen burn out process
A Standard patent application filed on 09 October 2003 credited to Jeffrey, C. Hedrick ; Shyng-Tsong, Chen ; Christy, S. Tyberg ; Kelly, Malone ; Satyanarayana, Nitta ; Stephen, M. Gates

Details

Application number :

2003282483  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Post cmp porogen burn out process  

Inventor :

Jeffrey, C. Hedrick ; Shyng-Tsong, Chen ; Christy, S. Tyberg ; Kelly, Malone ; Satyanarayana, Nitta ; Stephen, M. Gates  

Agent name :

 

Address for service :

 

Filing date :

09 October 2003  

Associated companies :

 

Applicant name :

INTERNATIONAL BUSINESS MACHINES CORP.  

Applicant address :

New Orchard Road, Armonk, NY 10504  

Old name :

 

Original Source :

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