Method using silicide contacts for semiconductor processing
A Standard patent application filed on 04 June 2003 credited to Brown, David E. ; Chan, Simon S. ; Besser, Paul R. ; Paton, Eric N.

Details

Application number :

2003278824  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method using silicide contacts for semiconductor processing  

Inventor :

Brown, David E. ; Chan, Simon S. ; Besser, Paul R. ; Paton, Eric N.  

Agent name :

 

Address for service :

 

Filing date :

04 June 2003  

Associated companies :

 

Applicant name :

ADVANCED MICRO DEVICES, INC.  

Applicant address :

One AMD Place, Mail Stop 68, P.O. Box 3453, Sunnyvale, CA 94088-3453  

Old name :

 

Original Source :

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