Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
A Standard patent application filed on 30 May 2003 credited to Lai, Canfeng ; Cox, Michael Santiago ; Krishnaraj, Padmanabhan ; Tanaka, Tsutomu ; Raoux, Sebastien ; Shamouilian, Shamouil ; Nowak, Thomas ; Porshnev, Peter I.

Details

Application number :

2003273232  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas  

Inventor :

Lai, Canfeng ; Cox, Michael Santiago ; Krishnaraj, Padmanabhan ; Tanaka, Tsutomu ; Raoux, Sebastien ; Shamouilian, Shamouil ; Nowak, Thomas ; Porshnev, Peter I.  

Agent name :

 

Address for service :

 

Filing date :

30 May 2003  

Associated companies :

 

Applicant name :

APPLIED MATERIALS INC.  

Applicant address :

3050 Bowers Avenue, Santa Clara, CA 95054  

Old name :

 

Original Source :

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