Method for lithographically structuring a substrate, and lacquer system
A Standard patent application filed on 27 August 2003 credited to Elian, Klaus ; Schumann, Jorg

Details

Application number :

2003271518  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method for lithographically structuring a substrate, and lacquer system  

Inventor :

Elian, Klaus ; Schumann, Jorg  

Agent name :

 

Address for service :

 

Filing date :

27 August 2003  

Associated companies :

 

Applicant name :

INFINEON TECHNOLOGIES AG  

Applicant address :

St.-Martin-Strasse 53, 81669 Munchen  

Old name :

 

Original Source :

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