Composition for forming antireflection film for lithography
A Standard patent application filed on 08 October 2003 credited to Nakayama, Keisuke ; Mizusawa, Ken-Ichi ; Kawamura, Yasuo ; Kishioka, Takahiro ; Enomoto, Tomoyuki ; Sakamoto, Rikimaru

Details

Application number :

2003271123  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Composition for forming antireflection film for lithography  

Inventor :

Nakayama, Keisuke ; Mizusawa, Ken-Ichi ; Kawamura, Yasuo ; Kishioka, Takahiro ; Enomoto, Tomoyuki ; Sakamoto, Rikimaru  

Agent name :

 

Address for service :

 

Filing date :

08 October 2003  

Associated companies :

 

Applicant name :

NISSAN CHEMICAL INDUSTRIES, LTD.  

Applicant address :

7-1, Kandanishiki-cho 3-chome, Chikoda-ku, Tokyo 101-0054  

Old name :

 

Original Source :

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