Polishing media for chemical mechanical planarization (cmp)
A Standard patent application filed on 18 September 2003 credited to Charatan, Robert ; Lin, Jibing

Details

Application number :

2003270725  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Polishing media for chemical mechanical planarization (cmp)  

Inventor :

Charatan, Robert ; Lin, Jibing  

Agent name :

 

Address for service :

 

Filing date :

18 September 2003  

Associated companies :

 

Applicant name :

LAM RESEARCH CORPORATION  

Applicant address :

4650 Cushing Parkway, Fremont, CA 94538  

Old name :

 

Original Source :

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