Reflective x-ray microscope and inspection system for examining objects with wavelengths ofd 100nm
A Standard patent application filed on 08 May 2003 credited to Zibold, Axel
;
Pauschinger, Dieter
;
Mann, Hans-Jurgen
;
Wedowski, Marco
;
Reinecke, Wolfgang
;
Dinger, Udo
;
Ulrich, Wilhelm
;
Harnisch, Wolfgang
;
Engel, Thomas
Details
Application number :
2003268097
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Reflective x-ray microscope and inspection system for examining objects with wavelengths ofd 100nm
Inventor :
Zibold, Axel
;
Pauschinger, Dieter
;
Mann, Hans-Jurgen
;
Wedowski, Marco
;
Reinecke, Wolfgang
;
Dinger, Udo
;
Ulrich, Wilhelm
;
Harnisch, Wolfgang
;
Engel, Thomas