High-k dielectric film, method of forming the same and related semiconductor device
A Standard patent application filed on 30 July 2003 credited to Lee, Kilho ; Lim, Chan

Details

Application number :

2003266410  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

High-k dielectric film, method of forming the same and related semiconductor device  

Inventor :

Lee, Kilho ; Lim, Chan  

Agent name :

 

Address for service :

 

Filing date :

30 July 2003  

Associated companies :

 

Applicant name :

INFINEON TECHNOLOGIES AG  

Applicant address :

St. Martin-Str. 53, 81669 Munchen  

Old name :

 

Original Source :

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