Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance
A Standard patent application filed on 19 September 2003 credited to Watson, Keith J. ; So, Ying Hung ; Bis, Scott Jerome

Details

Application number :

2003266166  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance  

Inventor :

Watson, Keith J. ; So, Ying Hung ; Bis, Scott Jerome  

Agent name :

 

Address for service :

 

Filing date :

19 September 2003  

Associated companies :

 

Applicant name :

DOW GLOBAL TECHNOLOGIES INC.  

Applicant address :

Washington Street, 1790 Building, Midland, MI 48674  

Old name :

 

Original Source :

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