Method of forming and/or modifying a dielectric film on a semiconductor surface
A Standard patent application filed on 02 September 2003 credited to Ludsteck, Alexandra ; Roters, Georg ; Nenyei, Zsolt ; Schulze, Jorg ; Dietl, Waltraud ; Eisele, Ignaz

Details

Application number :

2003265921  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of forming and/or modifying a dielectric film on a semiconductor surface  

Inventor :

Ludsteck, Alexandra ; Roters, Georg ; Nenyei, Zsolt ; Schulze, Jorg ; Dietl, Waltraud ; Eisele, Ignaz  

Agent name :

 

Address for service :

 

Filing date :

02 September 2003  

Associated companies :

 

Applicant name :

MATTSON TECHNOLOGY, INC.  

Applicant address :

47131 Bayside Parkway, Fremont, CA 94538  

Old name :

 

Original Source :

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