Method and apparatus for chemical vapor deposition of polysilicon
A Standard patent application filed on 18 February 2000 credited to Chandra, Mohan ; Jafri, Ijaz ; Talbott, Jonathan ; Prasad, Vishwanath ; Gupta, Kedar

Details

Application number :

33750  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for chemical vapor deposition of polysilicon  

Inventor :

Chandra, Mohan ; Jafri, Ijaz ; Talbott, Jonathan ; Prasad, Vishwanath ; Gupta, Kedar  

Agent name :

 

Address for service :

 

Filing date :

18 February 2000  

Associated companies :

 

Applicant name :

Gt Equipment Technologies Inc.  

Applicant address :

 

Old name :

 

Original Source :

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