Process and apparatus for pulsed dc magnetron reactive sputtering of thin film coatings on large substrates using smaller sputter cathodes
A Standard patent application filed on 18 August 2003 credited to Bryan, Steven Rex
;
Jesse, D. Wolfe
Details
Application number :
2003265503
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Process and apparatus for pulsed dc magnetron reactive sputtering of thin film coatings on large substrates using smaller sputter cathodes