Rotary silicon wafer cleaning apparatus
A Standard patent application filed on 11 September 2003 credited to Morimoto, Akihiro ; Kawada, Koji ; Ikeda, Nobukazu ; Minami, Yukio ; Fujita, Takumi ; Shirai, Yasuyuki ; Ohmi, Tadahiro

Details

Application number :

2003264411  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Rotary silicon wafer cleaning apparatus  

Inventor :

Morimoto, Akihiro ; Kawada, Koji ; Ikeda, Nobukazu ; Minami, Yukio ; Fujita, Takumi ; Shirai, Yasuyuki ; Ohmi, Tadahiro  

Agent name :

 

Address for service :

 

Filing date :

11 September 2003  

Associated companies :

 

Applicant name :

OHMI, Tadahiro  

Applicant address :

1-17-301, Komegahukuro 2-chome, Aoba-ku, Sendai-shi, Miyagi 980-0813  

Old name :

 

Original Source :

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