Process for producing high-purity silicon and apparatus
A Standard patent application filed on 11 September 2003 credited to Fukuoka, Hiroshi ; Shimamune, Takayuki ; Yoshikawa, Tadashi ; Ishizawa, Nobuo

Details

Application number :

2003264408  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Process for producing high-purity silicon and apparatus  

Inventor :

Fukuoka, Hiroshi ; Shimamune, Takayuki ; Yoshikawa, Tadashi ; Ishizawa, Nobuo  

Agent name :

 

Address for service :

 

Filing date :

11 September 2003  

Associated companies :

 

Applicant name :

YOSHIKAWA, Tadashi  

Applicant address :

6-23, Tomoe 2-chome, Chigasaki-shi, Kanagawa 253-0056  

Old name :

 

Original Source :

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