Composition for forming silicon film and method for forming silicon film
A Standard patent application filed on 15 August 2003 credited to Iwasawa, Haruo ; Matsuki, Yasuo ; Kato, Hitoshi

Details

Application number :
2003262236  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Composition for forming silicon film and method for forming silicon film  
Inventor :
Iwasawa, Haruo ; Matsuki, Yasuo ; Kato, Hitoshi  
Agent name :
 
Address for service :
 
Filing date :
15 August 2003  
Associated companies :
 
Applicant name :
JSR CORPORATION  
Applicant address :
6-10, Tsukiji 5-chome, Chuo-ku, Tokyo 104-0045  
Old name :
 
Original Source :
Go  

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