Projection optical system and method for photolithography and exposure apparatus and method using same
A Standard patent application filed on 22 August 2003 credited to Williamson, David M.
;
Omura, Yasuhiro
;
Ikezawa, Hironori
Details
Application number :
2003256081
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Projection optical system and method for photolithography and exposure apparatus and method using same
Inventor :
Williamson, David M.
;
Omura, Yasuhiro
;
Ikezawa, Hironori
Agent name :
Address for service :
Filing date :
22 August 2003
Associated companies :
Applicant name :
NIKON CORPORATION
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331