Details
- Application number :
- 2003255034
- Application type :
- Standard
- Application status :
- LAPSED
- Under opposition :
- No
- Proceeding type :
-
- Invention title :
- Method of forming insulation film on semiconductor substrate
- Inventor :
- Hongoh, Toshiaki
- Agent name :
-
- Address for service :
-
- Filing date :
- 14 August 2003
- Associated companies :
-
- Applicant name :
- TOKYO ELECTRON LIMITED
- Applicant address :
- 3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481
- Old name :
-
- Original Source :
- Go