Wafer processing reactor having a gas flow control system and method
A Standard patent application filed on 01 February 2000 credited to Bartholomew, Lawrence Duane ; Boland, John Timothy ; Ewald, Robert Arthur ; Bailey, Robert Jeffrey

Details

Application number :

32203  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Wafer processing reactor having a gas flow control system and method  

Inventor :

Bartholomew, Lawrence Duane ; Boland, John Timothy ; Ewald, Robert Arthur ; Bailey, Robert Jeffrey  

Agent name :

 

Address for service :

 

Filing date :

01 February 2000  

Associated companies :

 

Applicant name :

Silicon Valley Group Thermal Systems, LLC  

Applicant address :

 

Old name :

 

Original Source :

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