Improved RF bipolar end effector for use in electrosurgical instruments
A Standard patent application filed on 01 February 2000 credited to Wampler, Scott D.
;
Yates, David C.
;
Collins, William L. Jr.
Details
Application number :
32199
Application type :
Standard
Application status :
SEALED
Under opposition :
No
Proceeding type :
Invention title :
Improved RF bipolar end effector for use in electrosurgical instruments
Inventor :
Wampler, Scott D.
;
Yates, David C.
;
Collins, William L. Jr.
Agent name :
Freehills Patent & Trade Mark Attorneys
Address for service :
Level 43 101 Collins Street MELBOURNE VIC 3000
Filing date :
01 February 2000
Associated companies :
Applicant name :
Ethicon Endo-Surgery, Inc.
Applicant address :
4545 Creek Road Cincinnati Ohio 45242-2839 United States of America