Exposure system and aberration measurement method for its projection optical system, and production method for device
A Standard patent application filed on 17 March 2000 credited to Ishikawa, Jun

Details

Application number :
31939  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Exposure system and aberration measurement method for its projection optical system, and production method for device  
Inventor :
Ishikawa, Jun  
Agent name :
 
Address for service :
 
Filing date :
17 March 2000  
Associated companies :
 
Applicant name :
Nikon Corporation  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor