Method and device for cleaning raw material gas introduction tube used in cvd film forming apparatus
A Standard patent application filed on 21 May 2003 credited to Hama, Kenichi ; Kage, Tsuyoshi ; Kobayashi, Takumi ; Kawabe, Takeharu

Details

Application number :

2003242357  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and device for cleaning raw material gas introduction tube used in cvd film forming apparatus  

Inventor :

Hama, Kenichi ; Kage, Tsuyoshi ; Kobayashi, Takumi ; Kawabe, Takeharu  

Agent name :

 

Address for service :

 

Filing date :

21 May 2003  

Associated companies :

 

Applicant name :

MITSUBISHI SHOJI PLASTICS CORPORATION  

Applicant address :

Gotanda Fuji Bldg., 27-2, Nishigotanda 1-chome, Shinagawa-ku, Tokyo 141-8535  

Old name :

 

Original Source :

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