Method and system for marking a workpiece such as a semiconductor wafer and laser marker for use therein
A Standard patent application filed on 16 May 2003 credited to Nemets, Chris
;
Gillespie, John R. Jr.
;
Ehrmann, Jonathan S.
;
Sullivan, Kevin E.
;
Pelsue, Kurt
;
Li, You C.
;
Woelki, Michael
;
Schramm, Rainer
;
Cahill, Steven P.
;
Leslie, Walter J.
;
Pukmel, Michael
Details
Application number :
2003239502
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method and system for marking a workpiece such as a semiconductor wafer and laser marker for use therein
Inventor :
Nemets, Chris
;
Gillespie, John R. Jr.
;
Ehrmann, Jonathan S.
;
Sullivan, Kevin E.
;
Pelsue, Kurt
;
Li, You C.
;
Woelki, Michael
;
Schramm, Rainer
;
Cahill, Steven P.
;
Leslie, Walter J.
;
Pukmel, Michael