Photo-induced cation curable epoxy resin composition
A Standard patent application filed on 07 May 2003 credited to Chen, Chunfu ; Gan, Yoke Ai ; Terada, Kazuyo

Details

Application number :

2003235866  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Photo-induced cation curable epoxy resin composition  

Inventor :

Chen, Chunfu ; Gan, Yoke Ai ; Terada, Kazuyo  

Agent name :

 

Address for service :

 

Filing date :

07 May 2003  

Associated companies :

 

Applicant name :

HENKEL LOCTITE CORPORATION  

Applicant address :

1001 Trout Brook Crossing, Rocky Hill, CT 06067  

Old name :

 

Original Source :

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