Substrate processing device, substrate processing method, and nozzle
A Standard patent application filed on 06 May 2003 credited to Hamada, Masahito ; Kiba, Yukio ; Miyahara, Osamu

Details

Application number :

2003235846  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Substrate processing device, substrate processing method, and nozzle  

Inventor :

Hamada, Masahito ; Kiba, Yukio ; Miyahara, Osamu  

Agent name :

 

Address for service :

 

Filing date :

06 May 2003  

Associated companies :

 

Applicant name :

TOKYO ELECTRON LIMITED  

Applicant address :

3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  

Old name :

 

Original Source :

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