Baffle plate and plasma etching device having same
A Standard patent application filed on 22 May 2003 credited to Lee, Jeung Woo ; Moon, Young Jae ; Kim, Moon Hwan

Details

Application number :

2003232645  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Baffle plate and plasma etching device having same  

Inventor :

Lee, Jeung Woo ; Moon, Young Jae ; Kim, Moon Hwan  

Agent name :

 

Address for service :

 

Filing date :

22 May 2003  

Associated companies :

 

Applicant name :

TOKYO ELECTRON KOREA LTD.  

Applicant address :

325-230 Dongcheon-ri, Suji-eup, Yongin-si, Gyeonggi-do 449-843  

Old name :

 

Original Source :

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