Method and device for depositing thin layers on a substrate in a height-adjustable process chamber
A Standard patent application filed on 16 April 2003 credited to Jurgensen, Holger ; Strauch, Gerhard Karl

Details

Application number :

2003227632  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and device for depositing thin layers on a substrate in a height-adjustable process chamber  

Inventor :

Jurgensen, Holger ; Strauch, Gerhard Karl  

Agent name :

 

Address for service :

 

Filing date :

16 April 2003  

Associated companies :

 

Applicant name :

AIXTRON AG  

Applicant address :

Kackertstrasse 15-17, 52072 Aachen  

Old name :

 

Original Source :

Go