Multirate processing for metrology of plasma rf source
A Standard patent application filed on 14 April 2003 credited to Kirk, Michael L. ; Coumou, David J.

Details

Application number :

2003224937  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Multirate processing for metrology of plasma rf source  

Inventor :

Kirk, Michael L. ; Coumou, David J.  

Agent name :

 

Address for service :

 

Filing date :

14 April 2003  

Associated companies :

 

Applicant name :

ENI TECHNOLOGY, INC.  

Applicant address :

100 Highpower Road, Rochester, NY 14623  

Old name :

 

Original Source :

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