Solution for removal of post dry etching residues
A Standard patent application filed on 02 May 2003 credited to Lu, Chih-Peng ; Ting, Jack ; Li, Ying-Hao ; Tu, Sheng-Hung ; Sheen, Wen-Shoei ; Shen, Kwo-Hung

Details

Application number :

2003223027  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Solution for removal of post dry etching residues  

Inventor :

Lu, Chih-Peng ; Ting, Jack ; Li, Ying-Hao ; Tu, Sheng-Hung ; Sheen, Wen-Shoei ; Shen, Kwo-Hung  

Agent name :

 

Address for service :

 

Filing date :

02 May 2003  

Associated companies :

 

Applicant name :

MERCK-KANTO ADVANCED CHEMICAL LTD.  

Applicant address :

6 Floor -5, No. 188, Section 5, Nanking East Road, Sungshan Chiu, Taipei 105  

Old name :

 

Original Source :

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