Processing method for photoresist master, production method for recording medium-use mater, production method for recording medium, photoresist master, recording medium-use master and recording medium
A Standard patent application filed on 10 March 2003 credited to Utsunomiya, Hajime ; Oyake, Hisaji ; Kato, Tatsuya ; Shibahara, Masanori ; Yoneyama, Kenji

Details

Application number :

2003221338  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Processing method for photoresist master, production method for recording medium-use mater, production method for recording medium, photoresist master, recording medium-use master and recording medium  

Inventor :

Utsunomiya, Hajime ; Oyake, Hisaji ; Kato, Tatsuya ; Shibahara, Masanori ; Yoneyama, Kenji  

Agent name :

 

Address for service :

 

Filing date :

10 March 2003  

Associated companies :

 

Applicant name :

TDK CORPORATION  

Applicant address :

1-13-1, Nihonbashi, Chuo-ku, Tokyo 103-8272  

Old name :

 

Original Source :

Go