Substrate processing device and substrate processing method, fast rotary valves, cleaning method
A Standard patent application filed on 25 March 2003 credited to Arami, Junichi ; Shinriki, Hiroshi

Details

Application number :

2003221137  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Substrate processing device and substrate processing method, fast rotary valves, cleaning method  

Inventor :

Arami, Junichi ; Shinriki, Hiroshi  

Agent name :

 

Address for service :

 

Filing date :

25 March 2003  

Associated companies :

 

Applicant name :

TOKYO ELECTRON LIMITED  

Applicant address :

3-6, Akasaka 5-Chome, Minato-Ku, Tokyo 107-8481  

Old name :

 

Original Source :

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