Method of producing an etch-resistant polymer structure using electron beam lithography
A Standard patent application filed on 31 January 2003 credited to Drouin, Dominique ; Cloutier, Melanie ; Beauvais, Jacques ; Lavallee, Eric

Details

Application number :

2003202379  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of producing an etch-resistant polymer structure using electron beam lithography  

Inventor :

Drouin, Dominique ; Cloutier, Melanie ; Beauvais, Jacques ; Lavallee, Eric  

Agent name :

 

Address for service :

 

Filing date :

31 January 2003  

Associated companies :

 

Applicant name :

QUANTISCRIPT INC.  

Applicant address :

2500 University Boulevard, Sherbrooke, Quebec J1K 2R1  

Old name :

 

Original Source :

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