Details
- Application number :
- 28694
- Application type :
- Standard
- Application status :
- LAPSED
- Under opposition :
- No
- Proceeding type :
-
- Invention title :
- Masks for use in optical lithography below 180 nm
- Inventor :
- Smith, Bruce W.
- Agent name :
-
- Address for service :
-
- Filing date :
- 04 February 2000
- Associated companies :
-
- Applicant name :
- Rochester Institute of Technology
- Applicant address :
-
- Old name :
-
- Original Source :
- Go