Details

Application number :
28694  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Masks for use in optical lithography below 180 nm  
Inventor :
Smith, Bruce W.  
Agent name :
 
Address for service :
 
Filing date :
04 February 2000  
Associated companies :
 
Applicant name :
Rochester Institute of Technology  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor