Gas purging method and exposure system, and device production method
A Standard patent application filed on 24 December 2002 credited to Shiraishi, Naomasa
Details
Application number :
2002366929
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Gas purging method and exposure system, and device production method
Inventor :
Shiraishi, Naomasa
Agent name :
Address for service :
Filing date :
24 December 2002
Associated companies :
Applicant name :
NIKON CORPORATION
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331