Ring mechanism, and plasma processing device using the ring mechanism
A Standard patent application filed on 12 December 2002 credited to Koshiishi, Akira ; Tanaka, Hideaki ; Tahara, Shigeru ; Hinata, Kunihiko ; Hashimoto, Mitsuru ; Ooyabu, Jun

Details

Application number :

2002366921  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Ring mechanism, and plasma processing device using the ring mechanism  

Inventor :

Koshiishi, Akira ; Tanaka, Hideaki ; Tahara, Shigeru ; Hinata, Kunihiko ; Hashimoto, Mitsuru ; Ooyabu, Jun  

Agent name :

 

Address for service :

 

Filing date :

12 December 2002  

Associated companies :

 

Applicant name :

TOKYO ELECTRON LIMITED  

Applicant address :

3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  

Old name :

 

Original Source :

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