Method for high resolution patterning using soft x-ray, process for preparing nano device using the method

Application number :: 2002362244
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Method for high resolution patterning using soft x-ray, process for preparing nano device using the method
Inventor :: Kim, Bongsoo ; Park, Joon Won ; La, Young-Hye ; Kim, Ki-Jeong ; Kang, Tai-Hee ; Moon, Joong Ho
Agent name :
Address for service :
Filing date :: 12 September 2002
Associated companies :
Applicant name :: POSTECH FOUNDATION
Applicant address :: San 31, Hyoja-dong, Nam-gu, Pohang-city, 790-784 Kyungsangbuk-do
Old name :
Original Source :: Go

Method for high resolution patterning using soft x-ray, process for preparing nano device using the method A Standard patent application filed on 12 September 2002 credited to Kim, Bongsoo ; Park, Joon Won ; La, Young-Hye ; Kim, Ki-Jeong ; Kang, Tai-Hee ; Moon, Joong Ho