Method and system for monitoring a process of material removal from the surface of a patterned structure
A Standard patent application filed on 04 December 2002 credited to Weingarten, Amit
;
Machavariani, Vladimir
;
Scheiner, David
;
Ravid, Avi
Details
Application number :
2002358939
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method and system for monitoring a process of material removal from the surface of a patterned structure
Inventor :
Weingarten, Amit
;
Machavariani, Vladimir
;
Scheiner, David
;
Ravid, Avi
Agent name :
Address for service :
Filing date :
04 December 2002
Associated companies :
Applicant name :
NOVA MEASURING INSTRUMENTS LTD.
Applicant address :
Weizmann Science Park, P.O. Box 266, 76100 Rehovoth