Formation of titanium nitride films using a cyclical deposition process
A Standard patent application filed on 16 July 2002 credited to Mak, Alfred W. ; Fang, Hongbin ; Chung, Hua ; Byun, Jeong Soo ; Lu, Xinliang ; Xi, Ming ; Kori, Moris ; Jian, Ping ; Lai, Ken K.

Details

Application number :

2002354919  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Formation of titanium nitride films using a cyclical deposition process  

Inventor :

Mak, Alfred W. ; Fang, Hongbin ; Chung, Hua ; Byun, Jeong Soo ; Lu, Xinliang ; Xi, Ming ; Kori, Moris ; Jian, Ping ; Lai, Ken K.  

Agent name :

 

Address for service :

 

Filing date :

16 July 2002  

Associated companies :

 

Applicant name :

YANG, Michael, X.  

Applicant address :

793 Cereza Dr., Fremont, CA 94555  

Old name :

 

Original Source :

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