Method and apparatus for the etching of photomask substrates using pulsed plasma
A Standard patent application filed on 22 October 2002 credited to Constantine, Christopher ; Onishi, Shinzo ; Johnson, David J.

Details

Application number :

2002348374  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for the etching of photomask substrates using pulsed plasma  

Inventor :

Constantine, Christopher ; Onishi, Shinzo ; Johnson, David J.  

Agent name :

 

Address for service :

 

Filing date :

22 October 2002  

Associated companies :

 

Applicant name :

UNAXIS USA, INC.  

Applicant address :

10050 16th Street North, St. Petersburg, FL 33716  

Old name :

 

Original Source :

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