Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device
A Standard patent application filed on 28 June 2002 credited to Nitta, Kazuyuki ; Shimatani, Satoshi ; Okubo, Waki ; Matsumi, Tatsuya ; Mimura, Takeyoshi

Details

Application number :

2002346237  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device  

Inventor :

Nitta, Kazuyuki ; Shimatani, Satoshi ; Okubo, Waki ; Matsumi, Tatsuya ; Mimura, Takeyoshi  

Agent name :

 

Address for service :

 

Filing date :

28 June 2002  

Associated companies :

 

Applicant name :

TOKYO OHKA KOGYO CO., LTD.  

Applicant address :

150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa 211-0012  

Old name :

 

Original Source :

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