Details

Application number :
2002346147  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Substrate treating device and substrate treating method, substrate flattening method  
Inventor :
Hirayama, Masaki ; Goto, Tetsuya ; Ohmi, Tadahiro ; Sugawa, Shigetoshi  
Agent name :
 
Address for service :
 
Filing date :
03 July 2002  
Associated companies :
 
Applicant name :
OHMI, Tadahiro  
Applicant address :
1-17-301, Komegafukuro 2-Chome, Aoba-ku, Sendai-Shi, Miyagi 980-0813  
Old name :
 
Original Source :
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